Sheath expansion of two-dimensional grid electrodes subjected to short pulses of negative high-voltage

被引:2
作者
Yi, Changho [1 ]
Lee, Huijea [1 ]
Park, Byungjae [1 ]
Namkung, Won [2 ]
Cho, Moohyun [1 ,3 ]
机构
[1] Pohang Univ Sci & Technol, Dept Phys, Pohang 790784, Gyeongbuk, South Korea
[2] Pohang Accelerator Lab, Pohang 790834, Gyeongbuk, South Korea
[3] Pohang Univ Sci & Technol, Div Adv Nucl Engn, Pohang 790784, Gyeongbuk, South Korea
基金
新加坡国家研究基金会;
关键词
sheath expansion; grid electrodes; high-voltage; IMMERSION ION-IMPLANTATION; PLASMA-SHEATH; MODEL; SIMULATION; DYNAMICS; ENERGY;
D O I
10.1088/0963-0252/24/1/015032
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Sheath expansion was investigated for two-dimensional (2D) grid electrodes which consist of a periodic array of cylindrical electrodes when short pulses of negative high-voltage were applied to the electrodes immersed in plasmas. In the sheath expansion model, a geometric function which describes the electrode system is crucial to numerically calculate the temporal evolution of a sheath boundary. In this paper, the 2D geometric function of grid electrodes was obtained by using XOOPIC (particle-in-cell) simulation. When the ratio between the diameter of cylindrical electrodes and grid spacing is fixed, we found that the geometric functions and the temporal evolutions of the sheath boundary for grid electrodes are identical in normalized coordinates. The numerical calculation results of the temporal evolutions of the sheath boundary showed reasonable agreements with the experimental measurements carried out in argon plasmas produced by hot filament discharges with neutral gas pressure of similar to 0.4 mTorr and plasma density in the order of 10(10) cm(-3) in a multi-dipole device.
引用
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页数:6
相关论文
共 29 条
[1]   EXCITATION OF PSEUDOWAVES IN A PLASMA VIA A GRID [J].
ALEXEFF, I ;
JONES, WD ;
LONNGREN, K .
PHYSICAL REVIEW LETTERS, 1968, 21 (13) :878-&
[2]   Ion energy measurements during plasma immersion ion implantation of an insulator [J].
Allan, S. Y. ;
McKenzie, D. R. ;
Bilek, M. M. M. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2010, 19 (04)
[3]   Transient plasma sheath model for thin conductors excited by negative high voltages with application to electrodynamic tethers [J].
Bilén, SG ;
Gilchrist, BE .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 2000, 28 (06) :2058-2074
[4]  
Birdsall C.K., 1991, Series in Plasma Physics
[5]   Sheath dynamics in plasma immersion ion implantation [J].
Brutscher, J ;
Gunzel, R ;
Moller, W .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (01) :54-60
[6]   Ion beam generation from sheath field of grid electrode and its application to surface treatment [J].
Cho, Yong-Sung ;
Lee, Hae June ;
Park, Chung-Hoo ;
Lee, Ho-Jun ;
Lee, Sung-Kwan .
JOURNAL OF APPLIED PHYSICS, 2006, 100 (12)
[7]   Dynamic sheath expansion in a non-uniform plasma with ion drift [J].
Chung, Kyoung-Jae ;
Choe, Jae-Myung ;
Kim, Gon-Ho ;
Hwang, Y. S. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2011, 20 (04)
[8]   PLASMA SOURCE ION-IMPLANTATION TECHNIQUE FOR SURFACE MODIFICATION OF MATERIALS [J].
CONRAD, JR ;
RADTKE, JL ;
DODD, RA ;
WORZALA, FJ ;
TRAN, NC .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (11) :4591-4596
[9]   Investigation of Plasma Immersion Ion Implantation Process in Magnetic Mirror Geometry [J].
de Dios Mitma Pillaca, Elver Juan ;
Ueda, Mario ;
Kostov, Konstantin Georgiev .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 2011, 39 (11) :3049-3055
[10]   NUMERICAL-SIMULATION OF PLASMA SHEATH EXPANSION, WITH APPLICATIONS TO PLASMA-SOURCE ION-IMPLANTATION [J].
EMMERT, GA ;
HENRY, MA .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (01) :113-117