Rapid prototyping of site-specific nanocontacts by electron and ion beam assisted direct-write nanolithography

Rapid prototyping of bottom-up nanostructure circuits is demonstrated, utilizing metal deposition and patterning methodology based on combined focused ion and electron beam induced decomposition of a metal-organic precursor gas. Ohmic contacts were fabricated using electron beam deposition, followed by the faster process of ion beam deposition for interconnect formation. Two applications of this method are demonstrated: three-terminal transport measurements of Y-junction carbon nanotubes and fabrication of nanocircuits for determination of electromechanical degradation of silver nanowires.