共 32 条
[2]
Line scale comparison Nano3
[J].
RECENT DEVELOPMENTS IN TRACEABLE DIMENSIONAL MEASUREMENTS II,
2003, 5190
:122-133
[3]
Bosse H, 2003, METROLOGIA, V40, P04002, DOI DOI 10.1088/0026-1394/40/1A/04002
[4]
Nanometer-accurate grating fabrication with scanning beam interference lithography
[J].
NANO- AND MICROTECHNOLOGY: MATERIALS, PROCESSES, PACKAGING, AND SYSTEMS,
2002, 4936
:126-134
[5]
Beam alignment for scanning beam interference lithography
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
2002, 20 (06)
:3071-3074
[6]
Chen CG, 2003, THESIS MIT CAMBRIDGE
[9]
Analysis of distortion in interferometric lithography
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1996, 14 (06)
:4009-4013
[10]
Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical system
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
2000, 18 (06)
:2911-2915