Electrical characteristics of proton-irradiated Sc2O3 passivated AlGaN/GaN high electron mobility transistors

被引:33
作者
Luo, B [1 ]
Kim, J
Ren, F
Gillespie, JK
Fitch, RC
Sewell, J
Dettmer, R
Via, GD
Crespo, A
Jenkins, TJ
Gila, BP
Onstine, AH
Allums, KK
Abernathy, CR
Pearton, SJ
Dwivedi, R
Fogarty, TN
Wilkins, R
机构
[1] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[2] USAF, Sensors Directorate, Res Lab, Wright Patterson AFB, OH 45433 USA
[3] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[4] Prairie View A&M Univ, Ctr Appl Radiat Res, Prairie View, TX 77446 USA
关键词
D O I
10.1063/1.1559631
中图分类号
O59 [应用物理学];
学科分类号
摘要
Sc2O3-passivated AlGaN/GaN high electron mobility transistors (HEMTs) were irradiated with 40 MeV protons to a fluence corresponding to approximately 10 years in low-earth orbit (5x10(9) cm(-2)). Devices with an AlGaN cap layer showed less degradation in dc characteristics than comparable GaN-cap devices, consistent with differences in average band energy. The changes in device performance could be attributed completely to bulk trapping effects, demonstrating that the effectiveness of the Sc2O3 layers in passivating surface states in the drain-source region was undiminished by the proton irradiation. Sc2O3-passivated AlGaN/HEMTs appear to be attractive candidates for space and terrestrial applications where resistance to high fluxes of ionizing radiation is a criteria. (C) 2003 American Institute of Physics.
引用
收藏
页码:1428 / 1430
页数:3
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