Use of plasma-activated gases in synthesis of solid-state nitrides

被引：3
作者：
Vajenine, Grigori V. [1 ,2 ]
机构：
[1] Max Planck Inst Festkorperforsch, D-70569 Stuttgart, Germany
[2] Univ Stuttgart, Inst Anorgan Chem, D-70569 Stuttgart, Germany
来源：
DALTON TRANSACTIONS | 2010年 / 39卷 / 26期
关键词：
ENHANCED CVD; CHEMICAL-TRANSPORT; DEPOSITION; FILMS; PRECURSORS; CHEMISTRY; ZIRCONIUM; HYDROGEN; HAFNIUM; N-2;
D O I：
10.1039/c000361a
中图分类号：
O61 [无机化学];
学科分类号：
070301 ; 081704 ;
摘要：
Basic properties of the plasma state are summarized, with the emphasis on low-pressure, non-isothermal, and cold plasma. The advantages of plasma activation in the synthesis of solid-state materials, especially nitrides, are discussed.
引用
收藏
页码：6013 / 6017
页数：5
相关论文
共 57 条
[1]   Absolute densities of N and excited N2 in a N2 plasma [J].
Agarwal, S ;
Hoex, B ;
van de Sanden, MCM ;
Maroudas, D ;
Aydil, ES .
APPLIED PHYSICS LETTERS, 2003, 83 (24) :4918-4920
[2]  
Baddour R., 1967, APPL PLASMA CHEM PRO
[3]   Ceramic fibers for matrix composites in high-temperature engine applications [J].
Baldus, P ;
Jansen, M ;
Sporn, D .
SCIENCE, 1999, 285 (5428) :699-703
[4]   Mixed hydrazido amido/imido complexes of tantalum, hafnium and zirconium: potential precursors for metal nitride MOCVD [J].
Baunemann, A ;
Kim, Y ;
Winter, M ;
Fischer, RA .
DALTON TRANSACTIONS, 2006, (01) :121-128
[5]   PREPARATION OF THE METASTABLE INTERSTITIAL COPPER NITRIDE, CU4N, BY DC PLASMA ION NITRIDING [J].
BLUCHER, J ;
BANG, K ;
GIESSEN, BC .
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1989, 117 :L1-L3
[6]  
BRESE NE, 1992, STRUCT BOND, V79, P307
[7]  
BROWN GR, 1970, ANGEW CHEM, V82, P187
[8]   CHEMICAL BEHAVIOR OF ACTIVE NITROGEN [J].
BROWN, R ;
WINKLER, CA .
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 1970, 9 (03) :181-&
[9]   Interaction of hydrogen with metal nitrides and imides [J].
Chen, P ;
Xiong, ZT ;
Luo, JZ ;
Lin, JY ;
Tan, KL .
NATURE, 2002, 420 (6913) :302-304
[10]  
Crookes W., 1878, Phil. Trans, V170, P135
123456