共 27 条
High-performance solution-processed polymer ferroelectric field-effect transistors
被引:859
作者:

Naber, RCG
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机构: Univ Groningen, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands

Tanase, C
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机构: Univ Groningen, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands

Blom, PWM
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机构: Univ Groningen, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands

Gelinck, GH
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机构: Univ Groningen, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands

Marsman, AW
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机构: Univ Groningen, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands

Touwslager, FJ
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机构: Univ Groningen, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands

Setayesh, S
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机构: Univ Groningen, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands

De Leeuw, DM
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机构: Univ Groningen, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands
机构:
[1] Univ Groningen, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands
[2] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
关键词:
D O I:
10.1038/nmat1329
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
We demonstrate a rewritable, non-volatile memory device with flexible plastic active layers deposited from solution. The memory device is a ferroelectric field-effect transistor (FeFET) made with a ferroelectric fluoropolymer and a bisalkoxy-substituted poly(p-phenylene vinylene) semiconductor material. The on- and off-state drain currents differ by several orders of magnitude, and have a long retention time, a high programming cycle endurance and short programming time. The remanent semiconductor surface charge density in the on- state has a high value of 18 mC m(-2), which explains the large on/off ratio. Application of a moderate gate field raises the surface charge to 26 mC m(-2), which is of a magnitude that is very difficult to obtain with conventional FETs because they are limited by dielectric breakdown of the gate insulator. In this way, the present ferroelectric-semiconductor interface extends the attainable field-effect band bending in organic semiconductors.
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页码:243 / 248
页数:6
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