Pseudo exchange bias due to rotational anisotropy

被引:10
作者
Ehrmann, A. [1 ]
Komraus, S. [2 ]
Blachowicz, T. [2 ]
Domino, K. [2 ]
Nees, M. K. [3 ]
Jakobs, P. J. [3 ]
Leiste, H. [3 ]
Mathes, M. [4 ]
Schaarschmidt, M. [4 ]
机构
[1] Bielefeld Univ Appl Sci, Fac Engn & Math, D-33619 Bielefeld, Germany
[2] Silesian Tech Univ, Inst Phys, Ctr Sci & Educ, PL-44100 Gliwice, Poland
[3] KIT, KNMF, D-76344 Eggenstein Leopoldshafen, Germany
[4] ACCESS eV, D-57072 Aachen, Germany
关键词
Exchange bias; Rotational anisotropy; Nanostructures; Simulation; Magnetization reversal; Patterned structures; MOKE; Lithography; BILAYERS; FILMS;
D O I
10.1016/j.jmmm.2016.03.071
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ferromagnetic nanostructure arrays with particle dimensions between 160 nm and 400 nm were created by electron-beam lithography. The permalloy structures consist of rectangular-shaped walls around a square open space. While measuring their magnetic properties using the Magneto-Optical Kerr Effect (MOKE), in some angular regions an exchange bias (EB) seemed to appear. This paper gives an overview of possible reasons for this "pseudo exchange bias" and shows experimentally and by means of micro magnetic simulations that this effect can be attributed to unintentionally measuring minor loops. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:7 / 10
页数:4
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