Plasma enhanced deposition of titanium aluminium composite films using organometallic aluminium precursors

被引：7

作者：

Taschner, C ^{[1
]}

Klosowski, J ^{[1
]}

Leonhardt, A ^{[1
]}

Dumichen, U ^{[1
]}

机构：

[1] Inst Festkorper & Werkstofforsch Dresden, D-01171 Dresden, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 1998年 / 98卷 / 1-3期

关键词：

plasma; titanium aluminium; thin films;

D O I：

10.1016/S0257-8972(97)00313-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thin films of aluminium composites with or without additional titanium have been deposited by plasma enhanced CVD (pulsed d.c. discharge) at a deposition temperature of 770 K (500 degrees C) using various organometallic aluminium starting compounds. The composition and the structure of the layers are determined by gas phase composition and plasma power density. Results concerning microhardness, adherence and coating structure are reported. AlN, AlON, and (Ti,Al)(O,N) coatings could be successfully prepared under the described conditions, but we have failed in depositing crystalline aluminium oxide layers. (C) 1998 Elsevier Science S.A.

引用

页码：925 / 933

页数：9

共 13 条

[1] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIN AND TIC ON STEEL - PROPERTIES OF COATINGS
ARAI, T
FUJITA, H
OGURI, K
[J]. THIN SOLID FILMS, 1988, 165 (01) : 139 - 148
[2] Fredriksson E., 1993, Journal of Chemical Vapor Deposition, V1, P333
[3] IKEDA T, 1991, THIN SOLID FILMS, V195, P99, DOI 10.1016/0040-6090(91)90262-V
[4] JEHN H, 1988, METALL, V42, P658
[5] A NEW ROUTE TO THE DEPOSITION OF AL2O3 BY MOCVD
JONES, AC
HOULTON, DJ
RUSHWORTH, SA
CRITCHLOW, GW
[J]. JOURNAL DE PHYSIQUE IV, 1995, 5 (C5): : 557 - 560
[6] Oxidation behavior of titanium-aluminium nitrides
Joshi, A
Hu, HS
[J]. SURFACE & COATINGS TECHNOLOGY, 1995, 76-77 (1-3) : 499 - 507
[7] THE STRUCTURE AND COMPOSITION OF TI-ZR-N, TI-AL-ZR-N AND TI-AL-V-N COATINGS
KNOTEK, O
BOHMER, M
LEYENDECKER, T
JUNGBLUT, F
[J]. MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1988, 106 : 481 - 488
[8] (TI1-XALX)N COATINGS BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
LEE, SH
RYOO, HJ
LEE, JJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1994, 12 (04): : 1602 - 1607
[9] Leonhardt A, 1995, SURF COAT TECH, V76, P225, DOI 10.1016/0257-8972(95)02634-7
[10] MUNZ WD, 1986, J VAC SCI TECHNOL A, V4, P2717, DOI 10.1116/1.573713

← 1 2 →