X-ray emission from aluminium under intense, ultrashort irradiation

被引：7

作者：

Banerjee, S ^{[1
]}

Kumar, GR ^{[1
]}

Tribedi, LC ^{[1
]}

机构：

[1] Tata Inst Fundamental Res, Bombay 400005, Maharashtra, India

来源：

EUROPEAN PHYSICAL JOURNAL D | 2000年 / 11卷 / 02期

关键词：

D O I：

10.1007/s100530070096

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present studies of X-ray emission from aluminium under picosecond and femtosecond irradiation in the intensity range similar to 10(12)-10(15) W cm(-2). We use a new and simple method to measure spectrally resolved absolute X-ray yields. It is shown that the X-ray yields can be obtained for arbitrary levels of X-ray flux. We present details of the variation of the absolute yields as a function of wavelength, intensity, polarization and pulse duration of the incident laser radiation. Electron temperatures in the keV range are observed at 10(15) W cm(-2) with femtosecond laser pulses.

引用

页码：295 / 300

页数：6

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