The effects of interfacial dipoles on the properties of SiC group III nitride hetero-structures

被引:0
|
作者
Lucovsky, G [1 ]
Yang, H
Lupke, G
机构
[1] N Carolina State Univ, Dept Phys, Raleigh, NC 27695 USA
[2] N Carolina State Univ, Dept Mat Sci & Engn, Raleigh, NC 27695 USA
[3] N Carolina State Univ, Dept Elect & Comp Engn, Raleigh, NC 27695 USA
[4] N Carolina State Univ, Dept Chem, Raleigh, NC 27695 USA
[5] Vanderbilt Univ, Dept Phys, Nashville, TN 37235 USA
来源
SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2 | 1998年 / 264-2卷
关键词
semiconductor hetero-interface; charge transfer dipole; electronegativity; dipole moment; infrared effective charge;
D O I
10.4028/www.scientific.net/MSF.264-268.299
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Much of the research on hetero-epitaxial growth of compound semiconductors on elemental and compound semiconductor substrates has emphasized the degree to which the two semiconductors must be lattice-matched to produce hetero-structures with a minimum number of extended defects. This paper indicates that interfacial dipoles also play a significant role in the properties of heterointerfaces when the two semiconductors of a nearly lattice-matched pair come from different columns of the periodic table as in i) Gap and Si, ii) ZnSe and GaAs and iii) AIN and SiC.
引用
收藏
页码:299 / 302
页数:4
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