Influence of Au thickness on the optical and electrical properties of transparent and conducting TiO2/Au/TiO2 multilayer films

被引:15
作者
Kim, Daeil [1 ]
机构
[1] Univ Ulsan, Sch Mat Sci & Engn, Ulsan 680749, South Korea
关键词
TiO2; Au; Optical transmittance; Resistivity; Work function;
D O I
10.1016/j.optcom.2009.12.067
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Au-intermediate TiO2/Au/TiO2 (TAT) multilayer films were deposited by RF magnetron sputtering onto glass substrates. Changes in the optical and electrical properties of the films were investigated with respect to the thickness of the Au interlayer. The observed optical and electrical properties were dependent on the thickness of the Au interlayer. The resistivity decreased to 3.3 x 10(-4) Omega CM for TiO2 films with a 20 nm-thick Au interlayer and the optical transmittance was also influenced by the Au interlayer. Although optical transmittance deteriorated as ALL thickness increased, TiO2 films with a 5 nm-thick Au interlayer showed a relatively high optical transmittance of 80% at a wavelength of 550 nm. In addition, since a TAT film with a 5 nm-thick Au interlayer showed a relatively high work function value, it is an alternative candidate for use as a transparent anode in OLEDs and flat panel displays. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:1792 / 1794
页数:3
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