Anomalous charge loss from floating-gate memory cells due to heavy ions irradiation

被引:47
作者
Cellere, G [1 ]
Paccagnella, A
Larcher, L
Chimenton, A
Wyss, J
Candelori, A
Modelli, A
机构
[1] Univ Modena & Reggio Emilia, DISMI, I-42100 Reggio Emilia, Italy
[2] INFM, I-42100 Modena, Italy
[3] Univ Ferrara, I-44100 Ferrara, Italy
[4] Univ Cassino, Fac Ingn, I-03043 Cassino, Italy
[5] Ist Nazl Fis Nucl, I-35100 Padua, Italy
[6] ST Microelect, I-20024 Agrate Brianza, MI, Italy
关键词
floating gate; gate leakage; memory reliability; single event effects;
D O I
10.1109/TNS.2002.805339
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We are presenting new data on the charge loss in large floating gate (FG) memory arrays subjected to heavy ion irradiation. Existing models for charge loss from charged, FG and generation-recombination after a heavy ion strike are insufficient to justify. (or in contrast with) our experimental results. In particular, the charge loss is by far larger than predicted by existing models, it depends on the number of generated holes, not on those surviving recombination, and it is larger for, FGs with larger threshold voltage before irradiation. We show that these data can be explained as the effect of two different mechanisms. The first one is a semi-permanent multi trap-assisted tunneling (TAT), Which closely resembles anomalous stress induced leakage current (SILC) in electrically stressed devices. The second mechanism is a transient phenomenon responsible for the largest part of the lost FG charge. Detailed physical modeling of this mechanism is still not available, owing to the limited knowledge of the physical background under these phenomena, but three possible models are explored and discussed.
引用
收藏
页码:3051 / 3058
页数:8
相关论文
共 46 条
[1]  
BARBOTTIN G, 1989, INSTABILITIES SILICO, V2
[2]  
BERTAZZONI S, 2000, P RADECS 00 SEPT, P229
[3]   CHARGE YIELD AND DOSE EFFECTS IN MOS CAPACITORS AT 80-K [J].
BOESCH, HE ;
MCGARRITY, JM .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1976, 23 (06) :1520-1525
[4]   A new physics-based model for understanding single-event gate rupture in linear devices [J].
Boruta, N ;
Lum, GK ;
O'Donnell, H ;
Robinette, L ;
Shaneyfelt, MR ;
Schwank, JR .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2001, 48 (06) :1917-1924
[5]   PRACTICAL APPROACH TO DETERMINING CHARGE COLLECTED IN MULTIJUNCTION STRUCTURES DUE TO THE ION SHUNT EFFECT [J].
BROWN, AO ;
BHUVA, B ;
KERNS, SE ;
STAPOR, WJ .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1993, 40 (06) :1918-1925
[6]   CHARGE COLLECTION IN CMOS/SOS STRUCTURES [J].
CAMPBELL, AB ;
KNUDSON, AR ;
STAPOR, WJ ;
SHAPIRO, P ;
DIEHLNAGLE, SE ;
HAUSER, J .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1985, 32 (06) :4128-4132
[7]  
Cappelletti P., 1999, FLASH MEMORIES, VFirst
[8]   Radiation effects on floating-gate memory cells [J].
Cellere, G ;
Pellati, P ;
Chimenton, A ;
Wyss, J ;
Modelli, A ;
Larcher, L ;
Paccagnella, A .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2001, 48 (06) :2222-2228
[9]   Micro breakdown in small-area ultrathin gate oxides [J].
Cellere, G ;
Larcher, L ;
Valentini, MG ;
Paccagnella, A .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2002, 49 (08) :1367-1374
[10]  
DEGRAEVE R, 2001, IEDM WASH DC