共 21 条
Stress-adaptive meander track for stretchable electronics
被引:12
作者:

Biswas, Shantonu
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Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany

Reiprich, Johannes
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Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany

Pezoldt, Joerg
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Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany

Hein, Matthias
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Tech Univ Ilmenau, Inst INIT, Fachgebiet Hochfrequenz & Mikrowellentech, Helmholtzpl 2, D-98693 Ilmenau, Germany Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany

Stauden, Thomas
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Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany

Jacobs, Heiko O.
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Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany
机构:
[1] Tech Univ Ilmenau, Inst Mikro & Nanotechnol MacroNano, Fachgebiet Nanotechnol, Gustav Kirchhoff Str 1, D-98693 Ilmenau, Germany
[2] Tech Univ Ilmenau, Inst INIT, Fachgebiet Hochfrequenz & Mikrowellentech, Helmholtzpl 2, D-98693 Ilmenau, Germany
来源:
FLEXIBLE AND PRINTED ELECTRONICS
|
2018年
/
3卷
/
03期
关键词:
stretchable electronics;
stretchable interconnect;
meander metal track;
stress-adaptive metal track;
metal track design;
stress analysis;
CIRCUITS;
DESIGN;
D O I:
10.1088/2058-8585/aad583
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Stretchable metallic interconnects are commonly designed using a meander-shaped metal track with a uniform width. This article reports on a 'stress-adaptive' metal track design which varies in width to accommodate the produced torque in the metal track during stretching. The stress-adaptive design is inspired by computational and experimental studies of two conventional meander-shape metal tracks identifying a common failure mode; specifically, the propagation of torque leading to twist and mechanical fatigue. The understanding gained led to the stress-adaptive design. The stress-adaptive structure is compared with horseshoe- and U-shaped references and shows improvements in the stress distribution, levels of twist, maximum level of elongation (>320%), and required stretch and release cycles (>6000 at 150% elongation) to cause failure in a long term cycling test.
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Univ Ghent, ELIS TFCG Microsyst, B-9000 Ghent, Belgium IMEC, IPSI REMO, B-3001 Louvain, Belgium

Vandevelde, Bart
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机构:
IMEC, IPSI REMO, B-3001 Louvain, Belgium IMEC, IPSI REMO, B-3001 Louvain, Belgium

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[10]
High-conductivity elastomeric electronics
[J].
Gray, DS
;
Tien, J
;
Chen, CS
.
ADVANCED MATERIALS,
2004, 16 (05)
:393-+

Gray, DS
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机构: Johns Hopkins Univ, Dept Biomed Engn, Baltimore, MD 21205 USA

Tien, J
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机构: Johns Hopkins Univ, Dept Biomed Engn, Baltimore, MD 21205 USA

Chen, CS
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机构: Johns Hopkins Univ, Dept Biomed Engn, Baltimore, MD 21205 USA