Surface tension of liquid silicon

被引：21
|
作者：
Shishkin, AV [1 ]
Basin, AS [1 ]
机构：
[1] Russian Acad Sci, Kutateladze Inst Thermodynam, Siberian Div, Novosibirsk 630090, Russia
来源：
THEORETICAL FOUNDATIONS OF CHEMICAL ENGINEERING | 2004年 / 38卷 / 06期
关键词：
D O I：
10.1007/s11236-005-0043-2
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
Experimental data on the surface tension of liquid silicon are analyzed. The effect of oxygen and other impurities is discussed. A large body of data is statistically processed. The expression sigma = 0.82-0.3 x 10(-3)(T - 1685) (J/m(2)) is recommended for the surface tension as a function of temperature in the range from 1685 to 1830 K.
引用
收藏
页码：660 / 668
页数：9
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