Assessment of surface roughness of substrates subjected to plasma-chemical etching

被引：1
|
作者：
Glyanko, M. S. [1 ]
Volkov, A. V. [1 ]
Fomchenkov, S. A. [1 ]
机构：
[1] Samara State Aerosp Univ Natl Res Univ, Dept Nanoengn, Samara 443086, Russia
来源：
1ST INTERNATIONAL SCHOOL AND CONFERENCE SAINT-PETERSBURG OPEN 2014 ON OPTOELECTRONICS, PHOTONICS, ENGINEERING AND NANOSTRUCTURES | 2014年 / 541卷
关键词：
D O I：
10.1088/1742-6596/541/1/012100
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The model based on fractional Brownian surface for substrate surface roughness assessment subjected to plasma-chemical etching is proposed.
引用
收藏
页数：4
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