A Physics-Based Empirical Model of Dynamic IOFF Under Switching Operation in p-GaN Gate Power HEMTs

被引:4
作者
Wang, Yuru [1 ]
Chen, Tao [1 ]
Hua, Mengyuan [2 ]
Wei, Jin [3 ]
Zheng, Zheyang [1 ]
Song, Wenjie [1 ]
Yang, Song [1 ]
Zhong, Kailun [1 ]
Chen, Kevin [1 ]
机构
[1] Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong 999077, Peoples R China
[2] Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518000, Peoples R China
[3] Peking Univ, Inst Microelect, Beijing 100871, Peoples R China
关键词
Dynamic I-OFF; empirical model; p-GaN gate HEMT; physics-based; ALGAN/GAN HEMTS; THRESHOLD VOLTAGE; INJECTION; DEGRADATION; PASSIVATION; TRANSISTOR; MECHANISM; TRAPS;
D O I
10.1109/TPEL.2021.3062450
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this article, an empirical model of dynamic OFF-state leakage current (I-OFF) under switching operation in p-GaN gate high-electron-mobility transistors is established based on its underlying physical mechanism. The impacts of relevant switching conditions, including switching frequency, duty cycle, OFF-state delay time, gate drive voltage, and temperature are all considered in the modeling of dynamic I-OFF. A good agreement between the modeled dynamic I-OFF and experimental results is achieved. Based on this model, the OFF-state power consumption (E-OFF) and OFF/ON-state power consumption ratio (E-OFF/E-ON) under dynamic switching operation can be predicted for various switching conditions. As the device worked at a high switching frequency (e.g., 1 MHz and duty cycle: 50%) with a gate drive voltage of 7 V and temperatures from 25 to 150 degrees C, the E-OFF/E-ON ratio is calculated from 0.53% to 0.07%, which is three to two orders of magnitude higher than what is projected from static OFF-state current characteristics.
引用
收藏
页码:9796 / 9805
页数:10
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