Rough surface adhesion in the presence of capillary condensation

被引：51
作者：
DelRio, Frank W. [1 ]
Dunn, Martin L.
Phinney, Leslie M.
Bourdon, Chris J.
de Boer, Maarten P.
机构：
[1] Univ Calif Berkeley, Dept Chem Engn, Berkeley, CA 94720 USA
[2] Univ Colorado, Dept Mech Engn, Boulder, CO 80309 USA
[3] Sandia Natl Labs, Microscale Sci & Technol Dept, Albuquerque, NM 87185 USA
[4] Sandia Natl Labs, MEMS Core Technol Dept, Albuquerque, NM 87185 USA
来源：
APPLIED PHYSICS LETTERS | 2007年 / 90卷 / 16期
关键词：
D O I：
10.1063/1.2723658
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Capillary condensation of water can have a significant effect on rough surface adhesion. To explore this phenomenon between micromachined surfaces, the authors perform microcantilever experiments as a function of surface roughness and relative humidity (RH). Below a threshold RH, the adhesion is mainly due to van der Waals forces across extensive noncontacting areas. Above the threshold RH, the adhesion jumps due to capillary condensation and increases towards the upper limit of Gamma = 144 mJ/m(2). A detailed model based on the measured surface topography qualitatively agrees with the experimental data only when the topographic correlations between the upper and lower surfaces are considered. (C) 2007 American Institute of Physics.
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