Modification studies of polyethylene by multi-ion implantation by laser ion source - art. no. 634638

被引:0
|
作者
Nassi, Vincenzo [1 ]
Torrisi, Lorenzo [1 ]
Visco, Annamaria [1 ]
Lorusso, Antonella [1 ]
Velardi, Luciano [1 ]
Caretto, Giuseppe [1 ]
Belloni, Fabio [1 ]
Beltrano, John [1 ]
Campo, Nino [1 ]
机构
[1] Univ Lecce, Dept Phys, Lab Appl Elect, I-73100 Lecce, Italy
来源
XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, Pts 1 and 2 | 2007年 / 6346卷
关键词
UV laser; laser plasma; laser ion source; germanium; ion implantation;
D O I
10.1117/12.739344
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A UV pulsed lasers was employed to produce C and Ti ions of different charge with current densities of the order of 10 mA/cm(2). A post ion acceleration, up to 30 W, was employed to increase the ion energy and to implant polyethylene biocompatible surfaces up to a depth of about 200 nm. Preliminary results about surface properties indicate that implanted surfaces have higher wetting and micro-hardness with respect to un-implanted ones.
引用
收藏
页码:34638 / 34638
页数:6
相关论文
共 50 条
  • [1] Laser ion source for Ge implantation of silicon surfaces - art. no. 634634
    Bellom, Fabio
    Nassisi, Vincenzo
    Torrisi, Lorenzo
    Wolowski, Jerzy
    Doria, Domenico
    Lorussoa, Antonella
    Velardi, Luciano
    XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, Pts 1 and 2, 2007, 6346 : 34634 - 34634
  • [2] Femtosecond Laser Assisted Multi-Ion Implantation in Dielectrics
    Jose, Gin
    Fernandez, T. Toney
    Steenson, Paul
    Jha, A.
    2012 14TH INTERNATIONAL CONFERENCE ON TRANSPARENT OPTICAL NETWORKS (ICTON 2012), 2012,
  • [3] Multi-ion species model with initial presheath profile for plasma source ion implantation
    Kim, Hyung-Jin
    Surface and Coatings Technology, 1999, 112 (01): : 318 - 323
  • [4] Multi-ion species model with initial presheath profile for plasma source ion implantation
    Kim, HJ
    SURFACE & COATINGS TECHNOLOGY, 1999, 112 (1-3): : 318 - 323
  • [5] High-frequency Alfven waves in multi-ion coronal plasma:: Observational implications -: art. no. A09102
    Ofman, L
    Davila, JM
    Nakariakov, VM
    Viñas, AF
    JOURNAL OF GEOPHYSICAL RESEARCH-SPACE PHYSICS, 2005, 110 (A9)
  • [6] MULTI-ION SOURCE ELECTROMAGNETIC ISOTOPE SEPARATOR
    DUNJIC, B
    NUCLEAR INSTRUMENTS & METHODS, 1965, 38 (DEC): : 109 - &
  • [7] MULTI-ION SOURCE ELECTROMAGNETIC ISOTOPE SEPARATOR
    DUNJIC, B
    NUCLEAR INSTRUMENTS & METHODS, 1966, 40 (02): : 309 - &
  • [8] Ion implantation as insoluble treatment for resist stacking process - art. no. 692322
    Nakamura, Hiroko
    Shibata, Takeshi
    Rikimaru, Katsumi
    Ito, Sanae
    Tanaka, Satoshi
    Inoue, Soichi
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXV, PTS 1 AND 2, 2008, 6923 : 92322 - 92322
  • [9] Application of laser ion source for ion implantation technology
    Rosinski, M
    Badziak, J
    Boody, FP
    Gammino, S
    Hora, H
    Krása, J
    Láska, L
    Mezzasalma, AM
    Parys, P
    Rohlena, K
    Torrisi, L
    Ullschmied, J
    Wolowski, J
    Woryna, E
    VACUUM, 2005, 78 (2-4) : 435 - 438
  • [10] Laser ion source for multiple Ta ion implantation
    Andò, L
    Torrisi, L
    Gammino, S
    Beltrano, J
    Percolla, C
    Parasole, O
    PLASMA: PRODUCTION BY LASER ABLATION, 2004, : 142 - 148