Photocatalytic activity and photocorrosion of atomic layer deposited ZnO ultrathin films for the degradation of methylene blue

被引：50
作者：
Cao, Yan-Qiang [1 ]
Chen, Jun
Zhou, Hang
Zhu, Lin
Li, Xin
Cao, Zheng-Yi
Wu, Di
Li, Ai-Dong
机构：
[1] Nanjing Univ, Coll Engn & Appl Sci, Collaborat Innovat Ctr Adv Microstruct, Natl Lab Solid State Microstruct, Nanjing 210093, Jiangsu, Peoples R China
来源：
NANOTECHNOLOGY | 2015年 / 26卷 / 02期
基金：
国家教育部博士点专项基金资助;
关键词：
atomic layer deposition; ZnO ultrathin films; photocatalytic activity; photocorrosion; THIN-FILMS; DYE DEGRADATION; ZINC-OXIDE; TIO2; PHOTODEGRADATION; DECOLORIZATION; HYBRIDIZATION; ENHANCEMENT; INHIBITION; NANOFIBERS;
D O I：
10.1088/0957-4484/26/2/024002
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
ZnO ultrathin films with varied thicknesses of 7-70 nm were prepared at 200 degrees C on Si and fused quartz substrates by atomic layer deposition (ALD). The impact of film thickness and annealing temperature on the crystallinity, morphology, optical bandgap, and photocatalytic properties of ZnO in the degradation of methylene blue (MB) dye under UV light irradiation (lambda= 365 nm) has been investigated deeply. The as-deposited 28 nm thick ZnO ultrathin film exhibits highest photocatalytic activity, ascribed to the smallest band gap of 3.21 eV and proper thickness. The photocorrosion effect of ALD ZnO ultrathin films during photocatalytic process is observed. The presence of MB significantly accelerates the dissolution of ZnO ultrathin films. The possible photoetching mechanism of ZnO in MB solution is proposed.
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页数：9
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