Plasma Characteristics of 450 mm Diameter Ferrite-Enhanced Inductively Coupled Plasma Source

被引：9

作者：

Hong, Seung Pyo ^{[1
]}

Lim, Jong Hyeuk ^{[1
]}

Gweon, Gwang Ho ^{[1
]}

Yeom, Geun Young ^{[2
]}

机构：

[1] Sungkyunkwan Univ, Dept Mat Sci & Engn, Suwon 440746, Kyunggi Do, South Korea

[2] Sungkyunkwan Adv Inst Nano Technol NCRC, Suwon 440746, Kyunggi Do, South Korea

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2010年 / 49卷 / 08期

关键词：

D O I：

10.1143/JJAP.49.080217

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effect of C-shaped ferrite modules installed above a spiral-type inductively coupled plasma (ICP) antenna coil and the plasma characteristics of an ICP source operated at 2 MHz were investigated in order to realize 450 mm wafer processing The application of an appropriate amount of Ni-Zn ferrite modules to the antenna increased the plasma density slightly and decreased the plasma potential, while the application of the ferrite modules all over the antenna line decreased the plasma density and increased the plasma potential In particular, by installing the ferrite modules locally in a low-plasma-density region, plasma uniformity was improved effectively (C) 2010 The Japan Society of Applied Physics

引用

页数：3

共 8 条

[1]

CHEIN CF, 2007, P ISSM

[2]

ELLINGBOE AR, 2009, AVS 56 INT S PLASM S

[3] Inductively coupled plasma for polymer etching of 200 mm wafers [J].

Forgotson, N ;

Khemka, V ;

Hopwood, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (02) :732-737

[4] Planar RF induction plasma coupling efficiency [J].

Hopwood, J. .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (04) :460-464

[5] Plasma Characteristics of a Ni-Zn Ferrite Enhanced Internal-Type Inductively Coupled Plasma Source Operated at 2 and 13.56 MHz [J].

Kim, Kyong Nam ;

Lim, Jong Hyeuk ;

Yeom, Geun Young .

PLASMA CHEMISTRY AND PLASMA PROCESSING, 2010, 30 (01) :183-190

[6] Preparation of TiN films at room temperature by inductively coupled plasma assisted chemical vapor deposition [J].

Lee, DK ;

Lee, JJ ;

Joo, J .

SURFACE & COATINGS TECHNOLOGY, 2003, 171 (1-3) :24-28

[7] A traveling wave-driven, inductively coupled large area plasma source [J].

Wu, YX ;

Lieberman, MA .

APPLIED PHYSICS LETTERS, 1998, 72 (07) :777-779

[8]

YANG Y, 2009, AVS 56 INT S PLASM S

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