One-pot green preparation of deep eutectic solvent-assisted ZnO/GO nanocomposite for cefixime trihydrate photocatalytic degradation under UV-A irradiation

被引:26
作者
Cigeroglu, Zeynep [1 ]
Sahin, Selin [2 ]
Kazan, Emine Sena [3 ]
机构
[1] Usak Univ, Engn Fac, Dept Chem Engn, TR-64300 Usak, Turkey
[2] Istanbul Univ Cerrahpasa, Engn Fac, Dept Chem Engn, TR-34200 Istanbul, Turkey
[3] Gebze Tech Univ, Dept Chem Engn, TR-41400 Kocaeli, Turkey
关键词
Cefixime trihydrate; Antibiotic; Antibacterial resistance; Photocatalyst; ZnO; GO; DES; Deep eutectic solvent; RESPONSE-SURFACE METHODOLOGY; PHOTODEGRADATION; ANTIBIOTICS; COMPOSITE; PARTICLES; MECHANISM; REMOVAL;
D O I
10.1007/s13399-021-01734-0
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
In this study, one of the advanced oxidation processes (AOPs) was selected for the pharmaceutical's treatment from wastewaters. For this purpose, deep eutectic solvent (DES) consisting of choline-chloride and ethylene glycol at 1:2 M ratio was synthesized for preparation of zinc oxide/graphene oxide (ZnO/GO/DES) photocatalyst for degradation of the cefixime trihydrate (CFX) as a model of antibiotic via UV-A radiation. Photocatalytic degradation of CFX was statistically maximized as a response through the design of the experiments using a face-centered central composite design (FCCCD). The catalyst dose (0.3-0.7 g L-1), pH of media (4-10), and antibiotic concentration (20-50 mg L-1) were taken as a factor to construct the experimental design. Besides, photocatalytic reaction results showed that using DES served as at high degradation performance as 86% CFX degradation under 0.532 g L-1 catalyst dose, 20.13 mg L-1 initial CFX concentration, and 4.03 pH using UV-A radiation. Photocatalysts with DES have proved a crucial catalyst in antibiotic resistance in water treatment. Thus, the prepared deep eutectic solvent-based photocatalyst indicates marvelous effects for eliminating CFX.
引用
收藏
页码:S73 / S86
页数:14
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