Investigation of the shape of InGaAs/GaAs quantum dots

被引:0
作者
Lehman, SY [1 ]
Roshko, A [1 ]
Mirin, RP [1 ]
Bonevich, JE [1 ]
机构
[1] Natl Inst Stand & Technol, Boulder, CO 80305 USA
来源
QUANTUM CONFINED SEMICONDUCTOR NANOSTRUCTURES | 2003年 / 737卷
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Three samples of self-assembled In0.44Ga0.56As quantum dots (QDs) grown on (001) GaAs by molecular beam epitaxy (MBE) were studied using atomic force microscopy (AFM) and high-resolution transmission electron microscopy (TEM) in order to characterize the height, faceting, and densities of the QDs. The cross-sectional TEM images show both pyramidal dots and dots with multiple side facets. Multiple faceting has been observed only in dots more than 8.5 nm in height and allows increased dot volume without a substantial increase in base area. Addition of a GaAs capping layer is found to increase the diameter of the QDs from roughly 40 nm to as much as 200 run. The areal QD density is found to vary up to 50 % over the central 2 cm x 2 cm section of wafer and by as much as 23 % on a length scale of micrometers.
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页码:179 / 184
页数:6
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