Heteroepitaxial growth of InAs on GaAS(001) by in situ STM located inside MBE growth chamber

被引:18
作者
Tsukamoto, S.
Bell, G. R.
Arakawa, Y.
机构
[1] Univ Tokyo, Inst Ind Sci, Nanoelect Collaborat Res Ctr, Tokyo 1538505, Japan
[2] Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England
关键词
scanning tunneling microscopy; molecular beam epitaxy; quantum dots; InAs; GaAs;
D O I
10.1016/j.mejo.2006.05.011
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The growth of InAs on GaAs(001) is of great interest primarily due to the self-assembly of arrays of quantum dots (QDs) with excellent opto-electronic properties. However, a basic understanding of their spontaneous formation is lacking. Advanced experimental methods are required to probe these nanostructures dynamically in order to elucidate their growth mechanism. Scanning tunneling microscopy (STM) has been successfully applied to many GaAs-based materials grown by molecular beam epitaxy (MBE). Typical STM-MBE experiments involve quenching the sample and transferring it to a remote STM chamber under arsenic-free ultra-high vacuum. In the case of GaAs-based materials grown at substrate temperatures of 400-600 degrees C, operating the STM at room temperature ensures that the surface is essentially static on the time scale of STM imaging. To attempt dynamic experiments requires a system in which STM and MBE are incorporated into one unit in order to scan in situ during growth. Here, we discuss in situ STM results from just such a system, covering both QDs and the dynamics of the wetting layer. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1498 / 1504
页数:7
相关论文
共 21 条
[11]   Understanding the growth mechanisms of GaAs and InGaAs thin films by employing first-principles calculations [J].
Kratzer, P ;
Penev, E ;
Scheffler, M .
APPLIED SURFACE SCIENCE, 2003, 216 (1-4) :436-446
[12]   Understanding the growth mode transition in InAs/GaAs(001) quantum dot formation [J].
Krzyzewski, TJ ;
Joyce, PB ;
Bell, GR ;
Jones, TS .
SURFACE SCIENCE, 2003, 532 :822-827
[13]   Wetting layer evolution in InAs/GaAs(001) heteroepitaxy: effects of surface reconstruction and strain [J].
Krzyzewski, TJ ;
Joyce, PB ;
Bell, GR ;
Jones, TS .
SURFACE SCIENCE, 2002, 517 (1-3) :8-16
[14]   Atomic structure of the GaAs(001)-(2 x 4) surface resolved using scanning tunneling microscopy and first-principles theory [J].
LaBella, VP ;
Yang, H ;
Bullock, DW ;
Thibado, PM ;
Kratzer, P ;
Scheffler, M .
PHYSICAL REVIEW LETTERS, 1999, 83 (15) :2989-2992
[15]   A COMBINED MOLECULAR-BEAM EPITAXY AND SCANNING TUNNELING MICROSCOPY SYSTEM [J].
ORR, BG ;
SNYDER, CW ;
JOHNSON, M .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1991, 62 (06) :1400-1403
[16]   Tracing the two- to three-dimensional transition in the InAs/GaAs(001) heteroepitaxial growth [J].
Patella, F ;
Nufris, S ;
Arciprete, F ;
Fanfoni, M ;
Placidi, E ;
Sgarlata, A ;
Balzarotti, A .
PHYSICAL REVIEW B, 2003, 67 (20)
[17]   Atomistic insights for InAs quantum dot formation on GaAs(001) using STM within a MBE growth chamber [J].
Tsukamoto, S ;
Honma, T ;
Bell, GR ;
Ishii, A ;
Arakawa, Y .
SMALL, 2006, 2 (03) :386-389
[18]   Atomic-level in situ real-space observation of Ga adatoms on GaAs(001)(2 x 4)-As surface during molecular beam epitaxy growth [J].
Tsukamoto, S ;
Koguchi, N .
JOURNAL OF CRYSTAL GROWTH, 1999, 201 :118-123
[19]   Magic numbers in Ga clusters on GaAs (001) surface [J].
Tsukamoto, S ;
Koguchi, N .
JOURNAL OF CRYSTAL GROWTH, 2000, 209 (2-3) :258-262
[20]  
TSUKAMOTO S, 2001, MRS S P, V648