Deposition of Mo Oxide and Metallic Mo Films by Chemical Vapor Transport of MoO3(OH)2

被引：9

作者：

Lee, Young Jung ^{[1
]}

Seo, Young Ik ^{[1
]}

Kim, Se Hoon ^{[1
]}

Kim, Dae-Gun ^{[1
]}

Do Kim, Young ^{[1
]}

机构：

[1] Hanyang Univ, Div Engn & Mat Sci, Seoul 133791, South Korea

来源：

CHEMICAL VAPOR DEPOSITION | 2009年 / 15卷 / 7-9期

关键词：

CVT; Hydrogen reduction; Molybdenum; Molybdenum oxide; MoO3(OH)(2); Nanostructure; Thin film deposition; WO3-CUO POWDER MIXTURES; HYDROGEN-REDUCTION; THIN-FILMS; MOLYBDENUM TRIOXIDE; W-OXIDE; MOO3-WO3; BEHAVIOR; CO; CU;

D O I：

10.1002/cvde.200906738

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Molybdenum oxides have attracted interest as gas sensing, catalytic, photochromic, and electrochromic materials. Molybdenum coatings are currently applied to materials for friction and wear control over a wide temperature range; they are also resistant to corrosion and chemicals. In this study, a new technique for deposition of MoO2 and metallic Mo, through the chemical vapor transport (CVT) of MoO3(OH)(2) during hydrogen reduction of a MoO3 powder, is presented. MoO2 and metallic Mo are deposited in two temperature ranges during hydrogen reduction, namely, MoO3 -> MoO2 and MoO2 -> Mo, respectively. The MoO2 film is directly deposited by using volatile MoO3(OH)(2) gas formed during the hydrogen reduction of MoO3 to MoO2 at the lower temperature, while metallic Mo film is obtained by simultaneous hydrogen reduction of deposited MoO2 at the higher temperature.

引用

页码：199 / 203

页数：5

共 24 条

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