Fabrication of low-cost mold and nanoimprint lithography using polystyrene nanosphere

被引：23

作者：

Jeong, G. H. ^{[1
]}

Park, J. K. ^{[1
]}

Lee, K. K. ^{[1
]}

Jang, J. H. ^{[1
]}

Lee, C. H. ^{[1
]}

Kang, H. B. ^{[1
]}

Yang, C. W. ^{[1
]}

Suh, S. J. ^{[1
,2
]}

机构：

[1] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea

[2] Sungkyunkwan Univ, Adv Mat & Proc Res Ctr IT, Suwon 440746, South Korea

来源：

MICROELECTRONIC ENGINEERING | 2010年 / 87卷 / 01期

关键词：

Nanoimprint lithography; Nanosphere; Polymer mold; Nanopatterning; NANOSTRUCTURE ARRAY FABRICATION; LARGE-SCALE;

D O I：

10.1016/j.mee.2009.05.022

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The periodic arrays of nanostructure were successfully patterned on Si wafers by ultraviolet nanoimprint lithography (UV-NIL) using nanosphere lithography (NSL). Two-dimensional (2D) well ordered self-assembled arrays were obtained on Si wafer by using nanosphere and the tilted-drain method. We tried to combine two techniques and hard mold of Si mold for NIL and polymer mold of acrylate-based polymer were fabricated by NSL. The Si master mold and polymer mold were formed by Cr lift-off and ICP-RIE process. The surface has a low surface energy at the interface with 1 H. 1H, 2H, 2H-perfluorooctyl-trichlorosilane (FOTS) vapor-coating, which can eliminate the problem of the adherence to the surface of the mold during demolding. Finally, nanopatterns were formed by UV-NIL, where the residual layer was not observed. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：51 / 55

页数：5

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