Fabrication of low-cost mold and nanoimprint lithography using polystyrene nanosphere

被引：23

作者：

Jeong, G. H. ^{[1
]}

Park, J. K. ^{[1
]}

Lee, K. K. ^{[1
]}

Jang, J. H. ^{[1
]}

Lee, C. H. ^{[1
]}

Kang, H. B. ^{[1
]}

Yang, C. W. ^{[1
]}

Suh, S. J. ^{[1
,2
]}

机构：

[1] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea

[2] Sungkyunkwan Univ, Adv Mat & Proc Res Ctr IT, Suwon 440746, South Korea

来源：

MICROELECTRONIC ENGINEERING | 2010年 / 87卷 / 01期

关键词：

Nanoimprint lithography; Nanosphere; Polymer mold; Nanopatterning; NANOSTRUCTURE ARRAY FABRICATION; LARGE-SCALE;

D O I：

10.1016/j.mee.2009.05.022

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The periodic arrays of nanostructure were successfully patterned on Si wafers by ultraviolet nanoimprint lithography (UV-NIL) using nanosphere lithography (NSL). Two-dimensional (2D) well ordered self-assembled arrays were obtained on Si wafer by using nanosphere and the tilted-drain method. We tried to combine two techniques and hard mold of Si mold for NIL and polymer mold of acrylate-based polymer were fabricated by NSL. The Si master mold and polymer mold were formed by Cr lift-off and ICP-RIE process. The surface has a low surface energy at the interface with 1 H. 1H, 2H, 2H-perfluorooctyl-trichlorosilane (FOTS) vapor-coating, which can eliminate the problem of the adherence to the surface of the mold during demolding. Finally, nanopatterns were formed by UV-NIL, where the residual layer was not observed. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：51 / 55

页数：5

共 19 条

[1] Fabrication of 2D ordered arrays of cobalt silicide nanodots on (001)Si substrates
Cheng, S. L.
Lu, S. W.
Wong, S. L.
Chang, C. C.
Chen, H.
[J]. JOURNAL OF CRYSTAL GROWTH, 2007, 300 (02) : 473 - 477
[2] Fabrication of nanopillars by nanosphere lithography
Cheung, CL
Nikolic, RJ
Reinhardt, CE
Wang, TF
[J]. NANOTECHNOLOGY, 2006, 17 (05) : 1339 - 1343
[3] IMPRINT OF SUB-25 NM VIAS AND TRENCHES IN POLYMERS
CHOU, SY
KRAUSS, PR
RENSTROM, PJ
[J]. APPLIED PHYSICS LETTERS, 1995, 67 (21) : 3114 - 3116
[4] Nanoimprint lithography
Chou, SY
Krauss, PR
Renstrom, PJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 4129 - 4133
[5] Crichton M., 2002, Prey
[6] Nanostructure array fabrication with a size-controllable natural lithography
Haginoya, C
Ishibashi, M
Koike, K
[J]. APPLIED PHYSICS LETTERS, 1997, 71 (20) : 2934 - 2936
[7] NANOSPHERE LITHOGRAPHY - A MATERIALS GENERAL FABRICATION PROCESS FOR PERIODIC PARTICLE ARRAY SURFACES
HULTEEN, JC
VANDUYNE, RP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 1553 - 1558
[8] Fabrication of highly ordered pore array in anodic aluminum oxide
Hwang, SK
Jeong, SH
Hwang, HY
Lee, OJ
Lee, KH
[J]. KOREAN JOURNAL OF CHEMICAL ENGINEERING, 2002, 19 (03) : 467 - 473
[9] Multilayer soft mold for UV imprinting the 50 nm pitch dot array
Lee, Duhyun
Cho, E. H.
Kim, H. S.
Lee, B. K.
Lee, M. B.
Sohn, J. S.
Lee, C. H.
Suh, S. J.
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2008, 26 (02): : 514 - 517
[10] Fabrication of large-scale periodic silicon nanopillar arrays for 2D nanomold using modified nanosphere lithography
Li, Wei
Xu, Ling
Zhao, Wei-Ming
Sun, Ping
Huang, Xin-Fan
Chen, Kun-Ji
[J]. APPLIED SURFACE SCIENCE, 2007, 253 (22) : 9035 - 9038

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