Temperature variations of the surface of a silicon melt dye to evaporation of chemical species .1. Antimony addition

被引：3

作者：

Maeda, S ^{[1
]}

Kato, M ^{[1
]}

Abe, K ^{[1
]}

Nakanishi, H ^{[1
]}

Terashima, K ^{[1
]}

Hoshikawa, K ^{[1
]}

机构：

[1] SHINSHU UNIV,FAC EDUC,NAGANO 380,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1997年 / 144卷 / 09期

关键词：

D O I：

10.1149/1.1837980

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The influence of antimony addition on the temperature of the silicon melt surface was studied. It was found that the temperature of the silicon melt surface in a quartz crucible decreased due to evaporation of antimony oxide. This tendency was more pronounced under low pressure in the chamber. In the cases of less amount of antimony addition, the temperature variations were ambiguous. An approximate estimate for the latent heat of evaporation of species from the silicon melt surface was carried out based on our experimental results. The preliminary estimated result for the latent heat of evaporation of species was in the range of 110 to 170 kJ/mol.

引用

页码：3185 / 3188

页数：4

共 6 条

[1] HIRATA H, 1988, J JPN ASS CRYSTAL GR, V15, P61
[2] EVAPORATION OF OXYGEN-BEARING SPECIES FROM SI MELT AND INFLUENCE OF SB ADDITION
HUANG, XM
TERASHIMA, K
SASAKI, H
TOKIZAKI, E
ANZAI, Y
KIMURA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (4A): : 1717 - 1722
[3] ANALYSIS OF DEPOSITS EVAPORATED FROM SB-DOPED SI MELTS
HUANG, XM
TERASHIMA, K
TOKIZAKI, E
SASAKI, H
KIMURA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (6A): : 3305 - 3309
[4] EFFECT OF BACKGROUND GAS-PRESSURE ON EVAPORATION OF OXIDES FROM SB-DOPED SI MELT
HUANG, XM
TERASHIMA, K
IZUNOME, K
KIMURA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1994, 33 (7A): : L902 - L904
[5] EVAPORATION RATES OF OXIDES FROM UNDOPED AND SB-DOPED SI MELTS UNDER ATMOSPHERES OF PURE NE, AR, AND KR
HUANG, XM
TERASHIMA, K
TOKIZAKI, E
KIMURA, S
WHITBY, E
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7A): : 3808 - 3812
[6] 1970, THERMOPHYSICAL PROPE, V4, P5

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