Surface modification of silica particles with organoalkoxysilanes through two-step (acid-base) process in aqueous solution

被引:0
作者
Jeon, BJ [1 ]
Hah, HJ [1 ]
Koo, SM [1 ]
机构
[1] Hanyang Univ, Dept Chem Engn, Ceram Proc Res Ctr, Coll Engn, Seoul 133791, South Korea
来源
JOURNAL OF CERAMIC PROCESSING RESEARCH | 2002年 / 3卷 / 03期
关键词
silica; two-step process; surface modification; organoalkoxysilanes;
D O I
暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Surface modification of silica particles was achieved by two-step (acid-base) process in an aqueous solution with organoalkoxysilanes, such as methyltrimethoxysilane (MTMS), methyltriethoxysilane (MTES), vinyltrunethoxysilane (VTMS), and vinyltriethoxysilane (VTES). The relative hydrolysis and condensation rates of organoalkoxysilanes; could be elucidated from the kinetic data that were obtained by measuring the mixing time (hydrolysis) and the turbid time (condensation) in this system. Surface-modified silica particles were prepared by two-step process separating the hydrolysis and condensation procedures to easily control the condensation rate. The size of the surface-modified silica particles could be controlled by the ratio of monomer/silica seed. Control of the condensation rate and colloidal interaction could prevent the self-aggregation between primary particles. The size and morphology of the resulting particles were examined by FE-SEM and TEM. The particles were characterized by FTIR and TGA.
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页码:216 / 221
页数:6
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