193 nm photochemistry of chloromethylphenyl silane film and application to surface-imaging lithography.

被引：0
|
作者：
Dulcey, CS [1 ]
Brandow, SL [1 ]
Calvert, JM [1 ]
Chen, MS [1 ]
Dressick, WJ [1 ]
McElvany, S [1 ]
Nelson, HH [1 ]
机构：
[1] USN,RES LAB,WASHINGTON,DC 20375
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1997年 / 214卷
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
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页码：121 / PMSE
页数：2
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