193 nm photochemistry of chloromethylphenyl silane film and application to surface-imaging lithography.

被引：0

作者：

Dulcey, CS ^{[1
]}

Brandow, SL ^{[1
]}

Calvert, JM ^{[1
]}

Chen, MS ^{[1
]}

Dressick, WJ ^{[1
]}

McElvany, S ^{[1
]}

Nelson, HH ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC 20375

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1997年 / 214卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：121 / PMSE

页数：2

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