Systematic Achievement of Improved Atomic-Scale Contrast via Bimodal Dynamic Force Microscopy

被引：111

作者：

Kawai, Shigeki ^{[1
]}

Glatzel, Thilo ^{[1
]}

Koch, Sascha ^{[1
]}

Such, Bartosz ^{[1
]}

Baratoff, Alexis ^{[1
]}

Meyer, Ernst ^{[1
]}

机构：

[1] Univ Basel, Dept Phys, CH-4056 Basel, Switzerland

来源：

PHYSICAL REVIEW LETTERS | 2009年 / 103卷 / 22期

基金：

瑞士国家科学基金会;

关键词：

SILICON; (111)-(7X7); SURFACE;

D O I：

10.1103/PhysRevLett.103.220801

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Judiciously matched experiments, calculations, and theory demonstrate that a higher sensitivity to short-range interactions and, consequently, improved resolution on the atomic scale can be achieved by bimodal noncontact dynamic force microscopy. The combination of sub-A degrees ngstroumlm tip oscillation at the second flexural resonance of a commercially available silicon cantilever with the commonly used large amplitude oscillation at the fundamental resonance frequency enables this performance improvement while avoiding potentially damaging jump-to-contact instabilities.

引用

页数：4

共 32 条

[1] FREQUENCY-MODULATION DETECTION USING HIGH-Q CANTILEVERS FOR ENHANCED FORCE MICROSCOPE SENSITIVITY [J].