The acid-base character of interactions between xenon and selected carboxylic and sulfonic acids

被引：3
|
作者：
Gaszowski, Dawid [1 ]
Ilczyszyn, Marek [1 ]
机构：
[1] Univ Wroclaw, Fac Chem, Joliot Curie 14, PL-50383 Wroclaw, Poland
来源：
CHEMICAL PHYSICS | 2017年 / 488卷
关键词：
NMR CHEMICAL-SHIFT; HYDROGEN-BOND; AB-INITIO; ORGANIC-SOLVENTS; PKA VALUES; COMPLEXES; ANESTHESIA; SPECTRA; ENERGY; ARGON;
D O I：
10.1016/j.chemphys.2017.03.009
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Interactions of Xe atoms with RCO2H and RSO3H (R= CH3 and CF3) acids in different solvents are examined by analysis of Xe-129 chemical shifts extrapolated to zero solvent concentration. Obtained results are very sensitive to the Xe contacts with the methyl and trifluoromethyl groups as well as with the carboxylic and sulfonic groups of different acidity. The acid-base character of these acid-Xe interactions is considered. (C) 2017 Elsevier B.V. All rights reserved.
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页码：22 / 27
页数：6
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