Effects of low-temperature-buffer, rf-power, and annealing on structural and optical properties of ZnO/Al2O3(0001) thin films grown by rf-magnetron sputtering (vol 106, 023511, 2009)

被引：5
|
作者：
Liu, H. F. [1 ]
Chua, S. J. [1 ]
机构：
[1] ASTAR, IMRE, Singapore 117602, Singapore
来源：
JOURNAL OF APPLIED PHYSICS | 2009年 / 106卷 / 06期
关键词：
D O I：
10.1063/1.3238261
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页数：1
相关论文
共 50 条
  • [41] The structural, electrical and optical properties of ZnO/Al2O3 multilayer deposited on PET substrates by RF sputtering
    Khazamipour, N.
    Kabiri-Ameri-Aboutorabi, Sh.
    Asl-Solaimani, E.
    RENEWABLE ENERGY, 2013, 49 : 275 - 277
  • [42] Properties of Ti-doped Al2O3 thin films deposited by simultaneous RF and DC magnetron sputtering
    Lin, Su-Shia
    Gao, Yu-Lun
    Hu, Shao-Yin
    Fan, Sheng-You
    Tsai, Yung-Shiang
    VACUUM, 2014, 107 : 225 - 230
  • [43] Effects of annealing temperature on structure and electrical properties of (Na, K)NbO3 thin films grown by RF magnetron sputtering deposition
    Huang, Jiewen
    Liu, Jinsong
    Li, Ziquan
    Zhu, Kongjun
    Wang, Bijun
    Gu, Qinlin
    Feng, Bing
    Qiu, Jinhao
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2016, 27 (01) : 899 - 905
  • [44] Effects of deposition power and pressure on the crystallinity of Al-doped ZnO thin films at glass substrates by low temperature RF magnetron sputtering
    Zhang, Zhiyun
    Bao, Chonggao
    Ma, Shengqiang
    Zhang, Lili
    Hou, Shuzeng
    JOURNAL OF THE AUSTRALIAN CERAMIC SOCIETY, 2012, 48 (02): : 214 - 222
  • [45] Effects of annealing temperature on structure and electrical properties of (Na, K)NbO3 thin films grown by RF magnetron sputtering deposition
    Jiewen Huang
    Jinsong Liu
    Ziquan Li
    Kongjun Zhu
    Bijun Wang
    Qinlin Gu
    Bing Feng
    Jinhao Qiu
    Journal of Materials Science: Materials in Electronics, 2016, 27 : 899 - 905
  • [46] Effect of Process Parameters and Post Annealing Temperature on Structural and Optical Properties of MgTiO3 Thin Films Deposited by RF Magnetron Sputtering
    Kumar, T. Santhosh
    Bhuyan, R. K.
    Perumal, A.
    Pamu, D.
    ADVANCED NANOMATERIALS AND NANOTECHNOLOGY, 2013, 143 : 291 - 300
  • [47] Effects of Substrate Temperature and Sputtering Power on the Optical and Electrical Properties of Al-doped Zinc Oxide Thin Films by Reactive RF Magnetron Sputtering
    Lin, Peijie
    Lai, Yunfeng
    Ding, Xiaoqin
    Cheng, Shuying
    IAEDS15: INTERNATIONAL CONFERENCE IN APPLIED ENGINEERING AND MANAGEMENT, 2015, 46 : 1117 - 1122
  • [48] Structural, optical, and magnetic properties of Zn0.93Mn0.07O thin films grown on Al2O3 (0001) by r.f. magnetron sputtering
    Lee, S
    Lee, HS
    Kim, DS
    Kim, DY
    Woo, YD
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2004, 45 (05) : 1304 - 1307
  • [49] Effects of high-temperature annealing on magnetic properties of (Zn0.91Mn0.09)O thin films grown by RF magnetron sputtering
    Lee, S
    Lee, HS
    Hwang, SJ
    Shon, Y
    Kang, TW
    Kim, DY
    Kim, EK
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2006, 126 (2-3): : 300 - 305
  • [50] Epitaxial Growth and Characterization of Highly Ga-doped ZnO Thin Films Deposited on Al2O3 (0001) Substrates by Using the RF Magnetron Sputtering Method
    Shin, Seung Wook
    Pawar, S. M.
    Moon, Jong-Ha
    Kim, Jin Hyeok
    Kim, Sung Dae
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2009, 55 (03) : 1093 - 1097
12345