Effects of low-temperature-buffer, rf-power, and annealing on structural and optical properties of ZnO/Al2O3(0001) thin films grown by rf-magnetron sputtering (vol 106, 023511, 2009)

被引:5
|
作者
Liu, H. F. [1 ]
Chua, S. J. [1 ]
机构
[1] ASTAR, IMRE, Singapore 117602, Singapore
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D O I
10.1063/1.3238261
中图分类号
O59 [应用物理学];
学科分类号
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页数:1
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