Effects of low-temperature-buffer, rf-power, and annealing on structural and optical properties of ZnO/Al2O3(0001) thin films grown by rf-magnetron sputtering (vol 106, 023511, 2009)

被引：5
|
作者：
Liu, H. F. [1 ]
Chua, S. J. [1 ]
机构：
[1] ASTAR, IMRE, Singapore 117602, Singapore
来源：
JOURNAL OF APPLIED PHYSICS | 2009年 / 106卷 / 06期
关键词：
D O I：
10.1063/1.3238261
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页数：1
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