Reliability study of InGaP/GaAs HBT for 28V operation

被引:0
|
作者
Chau, Frank Hin-Fai [1 ]
Lin, Barry Jia-Fu [1 ]
Chen, Yan [1 ]
Kretschmar, Mark [1 ]
Lee, Chien-Ping [2 ]
Wang, Nan-lei Larry [1 ]
Sun, Xiaopeng [1 ]
Ma, Wenlong [1 ]
Xu, Sarah [3 ]
Hu, Peter [1 ]
机构
[1] WJ Commun Inc, 401 River Oaks Pkwy, San Jose, CA 95134 USA
[2] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu, Taiwan
[3] Skyworks Solut Inc, Woburn, MA USA
关键词
InGaPHBT; high voltage HBT; HBT reliability; wafer-level reliability;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports the device process and reliability aspects of a high voltage InGaP/GaAs HBT technology for 28V operation. The key differences and challenges from the material and process perspectives relative to the conventional low voltage HBT technology are first described. Long-term reliability tests performed at 28V bias voltage, 5.2kA/cm(2) current density and 310 degrees C junction temperature resulted in zero device failures after over 3600 hours of stress. Wafer-level reliability tests using extreme current stress conditions were used to force transistors to degrade in short time for quick checking of transistor integrity and process reliability. Transistor lifetimes were generally higher than those in conventional low voltage HBTs at similar junction temperatures. Combining with the previously reported ruggedness and linearity performance, the high voltage InGaP/GaAs HBT is a mature technology for use in the 28V high linearity power amplification.
引用
收藏
页码:191 / 194
页数:4
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