Oxidation of iron: The relation between oxidation kinetics and oxide electronic structure

被引：55

作者：

Roosendaal, SJ ^{[1
]}

Vredenberg, AM ^{[1
]}

Habraken, FHPM ^{[1
]}

机构：

[1] Univ Utrecht, Debye Inst, Sect Interface Phys, NL-3508 TA Utrecht, Netherlands

来源：

PHYSICAL REVIEW LETTERS | 2000年 / 84卷 / 15期

关键词：

D O I：

10.1103/PhysRevLett.84.3366

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The test of the validity of the Fromhold-Cook theory of metal oxidation for the O-2/Fe system in the tunnel regime is impeded by the growth of a passivating Fe2+/Fe3+ double layer at: T less than or equal to 150 degrees C. However, during an intermediate anneal step at 200 degrees C, the Fe3+ is reduced to Fe2+. The oxidation rate of this annealed layer is in agreement with the Fromhold-Cook theory. Ar room temperature, the ionic current is rate limiting, For T > 150 degrees C, the thermionic emission of electrons is rare limiting for oxygen coverages larger than 13 x 10(15) atoms/cm(2).

引用

页码：3366 / 3369

页数：4

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