Fabrication of diffraction grating for X-ray Talbot interferometer

被引：26

作者：

Matsumoto, Masatake

Takiguchi, Kinji

Tanaka, Makoto

Hunabiki, Yoichi

Takeda, Hiroaki

Momose, Atsushi

Utsumi, Yuichi

Hattori, Tadashi

机构：

[1] Nagase Chemtex Co Ltd, Tatsuno, Hyogo 6794124, Japan

[2] Himeji Inst Technol, Lab Adv Sci & Technol Ind, Himeji, Hyogo 67122, Japan

[3] Nano Create Co Ltd, Hyogo, Japan

[4] IKEX Ind Co Ltd, Aichi, Japan

[5] Univ Tokyo, Tokyo, Japan

[6] Univ Hyogo, Hyogo, Japan

来源：

MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2007年 / 13卷 / 5-6期

关键词：

Phase Imaging; Diffraction Grating; Spin Coating Method; Differential Phase Shift; Talbot Effect;

D O I：

10.1007/s00542-006-0226-8

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Imaging technology using the phase data attracts attention from many researchers as the observation technique of a biomechanical material. We produced a diffraction grating for obtaining high-resolution phase data. We designed the new process flow and developed the fabrication technique composed of MEMS technology, X-ray lithography, and micro electroplating. The X-ray lithography process was performed using the NewSUBARU synchrotron radiation facility. The line and the aspect ratio of this grating were 4 mu m and above 5 mu m, respectively. We evaluated the diffraction grating in SPring-8.

引用

页码：543 / 546

页数：4