Atomic Layer Deposition as a Tool to Modify Mesoporous Silica Membranes

Atomic layer deposition has been used as a tool to modify mesoporous silica membranes. SiO2 has been deposited within mesoporous silica membranes using SiCl4 and H2O catalyzed with pyridine. Pore size reduction was self-limited and selectively reduced defective pores. Covalent attachment of silanes was also demonstrated by ALD. Both amino and alkyl groups were attached to mesoporous silica membranes. ALD is very effective for both pore size reduction and surface modification, yet is limited by the quality of the support material. ALD is a promising technique for membrane synthesis.