3D integration technology with photosensitive mold for fan-out package

An innovative 3D packaging and integration technology with a newly developed photosensitive mold material was successfully demonstrated. This technology needs neither a tall Cu pillar electroplating nor a laser drilling. A test die was mounted face up on a substrate, then a more than 100 mu m thick photosensitive mold film was laminated on the whole substrate. The lithography process on the mold film was executed to make openings with depth of 10 mu m on the embedded die, and with depth of 110 mu m on the substrate. The Cu redistribution layer formed the electrical contacts between the die and the substrate through the photosensitive vias with different diameters and depths. The developed 3D package passed 1000 thermal cycles at -55/125 degrees C. This work disclosed future capability of a fan-out process using a photosensitive mold, thereby realizing a rapid growth of 3D integrated modules.