Towards a Monolithic, Substrate-Reusable and an All-Epitaxial Design for III-V-on-Si Solar Cells

被引:0
作者
Jain, Nikhil [1 ]
Clavel, Michael [1 ]
Goley, Patrick [1 ]
Hudait, Mantu [1 ]
机构
[1] Virginia Tech, Blacksburg, VA 24060 USA
来源
2015 IEEE 42ND PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC) | 2015年
关键词
III-V-on-Si; Ge-on-Si; heteroepitaxy; photovoltaic cells; solar cell design; GAAS; GE;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Integration of III-V multijunction solar cells on Si substrate can address the future levelized cost of energy by unifying the high-efficiency merits of III-V materials with the low-cost and abundance of Si. A Si-compatible monolithically integrated 3J InGaP/GaAs/Ge-Si cell design with a hybrid Ge-Si bottom cell is investigated. Utilizing a combination of comprehensive modeling and experimental material characterization techniques, we present our results for ultrathin epitaxial Ge directly grown on Si substrate using molecular beam epitaxy. Virtual "Ge-on-Si" substrates could provide a large-area, low-cost alternative to expensive GaAs wafers, a promising step towards realizing monolithic, high-efficiency and low-cost III-V-on-Si photovoltaics.
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页数:5
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