Patterned diamond particle films

被引：27

作者：

Fox, NA

Youh, MJ

Steeds, JW

Wang, WN

机构：

[1] Univ Bristol, HH Wills Phys Lab, Bristol BS8 1TL, Avon, England

[2] Univ Bath, Dept Phys, Bath BA2 7AY, Avon, England

[3] Smiths Ind Aerosp, Cent Res Dept, Cheltenham GL52 4SF, Glos, England

来源：

JOURNAL OF APPLIED PHYSICS | 2000年 / 87卷 / 11期

关键词：

D O I：

10.1063/1.373516

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This article reports on a technique for patterning diamond nanogrit which utilizes commercial ink-jet printer technology. Diamond nanogrit as small as 50 nm has been successfully printed onto substrates of glass, silicon, copper, and fused quartz. The technique has been used to demonstrate a quick and simple means to seed patterned. nanocrystalline diamond films onto candidate substrates of potentially any conceivable size or shape. (C) 2000 American Institute of Physics. [S0021-8979(00)09611-0].

引用

收藏

页码：8187 / 8191

页数：5

相关论文

共 17 条

[1] Field-emission studies of boron-doped CVD diamond films following surface treatments [J].

Fox, NA ;

Mary, S ;

Davis, TJ ;

Wang, WN ;

May, PW ;

Bewick, A ;

Steeds, JW ;

Butler, JE .

DIAMOND AND RELATED MATERIALS, 1997, 6 (09) :1135-1142

[2] CHARACTERIZATION OF CONDUCTING DIAMOND FILMS [J].

FUJIMORI, N ;

IMAI, T ;

DOI, A .

VACUUM, 1986, 36 (1-3) :99-102

[3] Characterization of heavily B-doped polycrystalline diamond films using Raman spectroscopy and electron spin resonance [J].

Gonon, P ;

Gheeraert, E ;

Deneuville, A ;

Fontaine, F ;

Abello, L ;

Lucazeau, G .

JOURNAL OF APPLIED PHYSICS, 1995, 78 (12) :7059-7062

[4] Ink-jet printing of doped polymers for organic light emitting devices [J].

Hebner, TR ;

Wu, CC ;

Marcy, D ;

Lu, MH ;

Sturm, JC .

APPLIED PHYSICS LETTERS, 1998, 72 (05) :519-521

[5]

HIGUCHI K, 1992, DIAM RELAT MATER, V4, P220

[6] SELECTIVE DEPOSITION OF DIAMOND CRYSTALS BY CHEMICAL VAPOR-DEPOSITION USING A TUNGSTEN-FILAMENT METHOD [J].

HIRABAYASHI, K ;

TANIGUCHI, Y ;

TAKAMATSU, O ;

IKEDA, T ;

IKOMA, K ;

IWASAKIKURIHARA, N .

APPLIED PHYSICS LETTERS, 1988, 53 (19) :1815-1817

[7]

KOIZUMI S, 1998, 5 NIRIM INT S ADV MA, P109

[8] SELECTIVE DEPOSITION OF DIAMOND FILMS ON ION-IMPLANTED SI(100) BY MICROWAVE PLASMA CHEMICAL VAPOR-DEPOSITION [J].

LIN, SJ ;

LEE, SL ;

HWANG, J ;

LIN, TS .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (11) :3255-3258

[9] LARGE AREA DIAMOND SELECTIVE NUCLEATION BASED EPITAXY [J].

MA, JS ;

YAGYU, H ;

HIRAKI, A ;

KAWARADA, H ;

YONEHARA, T .

THIN SOLID FILMS, 1991, 206 (1-2) :192-197

[10]

Nonaka Y., 1997, INT DISPL RES C IDRC, P238