Mn enriched surface of annealed (GaMn)As layers annealed under arsenic capping

被引:11
作者
Adell, M. [1 ]
Adell, J.
Ilver, L.
Kanski, J.
Sadowski, J.
Domagala, J. Z.
机构
[1] Chalmers, Dept Appl Phys, SE-41296 Gothenburg, Sweden
[2] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
来源
PHYSICAL REVIEW B | 2007年 / 75卷 / 05期
关键词
D O I
10.1103/PhysRevB.75.054415
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using synchrotron radiation based spectroscopic methods we have investigated the surface modifications of Ga1-xMnxAs layers due to post growth annealing under amorphous arsenic capping layers. It is established that there is a clear increase of the Mn concentration at the surface after annealing. This is ascribed to a reaction between diffusing Mn interstitials and the As capping. The reacted surface is smooth and well ordered with a 1x2 reconstruction. All data indicate that the annealed (GaMn)As is terminated by a monolayer MnAs in zinc-blende structure.
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页数:6
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