Micropollutants as internal probe compounds to assess UV fluence and hydroxyl radical exposure in UV/H 2 O 2 treatment

被引:15
作者
Wunsch, Robin [1 ,2 ]
Mayer, Carina [1 ,3 ,8 ]
Plattner, Julia [4 ]
Eugster, Fabienne [4 ,9 ]
Wulser, Richard [4 ]
Gebhardt, Jens [5 ]
Huebner, Uwe [6 ]
Canonica, Silvio [7 ]
Wintgens, Thomas [1 ,10 ]
von Gunten, Urs [2 ,7 ]
机构
[1] FHNW Univ Appl Sci & Arts Northwestern Switzerlan, Inst Ecopreneurship, Sch Life Sci, Hofackerstr 30, CH-4132 Muttenz, Switzerland
[2] Ecole Polytech Fed Lausanne EPFL, Sch Architecture Civil & Environm Engn ENAC, CH-1015 Lausanne, Switzerland
[3] Rhein Westfal TH Aachen, Aachener Verfahrenstechn, Chem Proc Engn, Forckenbeckstr 51, D-52074 Aachen, Germany
[4] IWB Ind Werke Basel, Margarethenstr 40, CH-4002 Basel, Switzerland
[5] Xylem Serv GmbH, Boschstr 4, D-32051 Herford, Germany
[6] Tech Univ Munich, Chair Urban Water Syst Engn, Garching, Germany
[7] Swiss Fed Inst Aquat Sci & Technol, Eawag, Uberlandstr 133, CH-8600 Dubendorf, Switzerland
[8] Nalco Deutschland GmbH, Solmsstr 41, D-60486 Frankfurt, Germany
[9] F Hoffmann La Roche & Cie AG, Sicherheit Gesundheits & Umweltschutz, Grenzacherstr 124, CH-4070 Basel, Switzerland
[10] Rhein Westfal TH Aachen, Inst Siedlungswasserwirtschaft, Mies van der Rohe Str 1, D-52074 Aachen, Germany
关键词
OH-radical exposure; UV; H; 2; O; AOP; in-situ probe compounds; kinetic modeling; sensitivity analysis; water treatment; ADVANCED OXIDATION PROCESSES; WASTE-WATER TREATMENT; ORGANIC-MATTER; RATE CONSTANTS; DEGRADATION KINETICS; POTASSIUM-IODIDE; DRINKING-WATER; SURFACE-WATER; PHARMACEUTICALS; OZONATION;
D O I
10.1016/j.watres.2021.116940
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Organic micropollutants (MPs) are increasingly detected in water resources, which can be a concern for human health and the aquatic environment. Ultraviolet (UV) radiation based advanced oxidation processes (AOP) such as low-pressure mercury vapor arc lamp UV/H 2 O 2 can be applied to abate these MPs. During UV/H 2 O 2 treatment, MPs are abated primarily by photolysis and reactions with hydroxyl radicals ( 'OH), which are produced in situ from H 2 O 2 photolysis. Here, a model is presented that calculates the applied UV fluence ( H calc ) and the 'OH exposure ( C T ?OH , calc ) from the abatement of two selected MPs, which act as internal probe compounds. Quantification of the UV fluence and hydroxyl radical exposure was generally accurate when a UV susceptible and a UV resistant probe compound were selected, and both were abated at least by 50 %, e.g., iopamidol and 5-methyl-1H-benzotriazole. Based on these key parameters a model was developed to predict the abatement of other MPs. The prediction of abatement was verified in various waters (sand filtrates of rivers Rhine and Wiese, and a tertiary wastewater effluent) and at different scales (laboratory experiments, pilot plant). The accuracy to predict the abatement of other MPs was typically within ?20 % of the respective measured abatement. The model was further assessed for its ability to estimate unknown rate constants for direct photolysis ( k UV , MP ) and reactions with 'OH ( k ?OH , MP ). In most cases, the estimated rate constants agreed well with published values, considering the uncertainty of kinetic data determined in laboratory experiments. A sensitivity analysis revealed that in typical water treatment applications, the precision of kinetic parameters ( k UV , MP for UV susceptible and k ?OH , MP for UV resistant probe compounds) have the strongest impact on the model?s accuracy. ? 2021 The Author(s). Published by Elsevier Ltd. This is an open access article under the CC BY license ( http://creativecommons.org/licenses/by/4.0/ )
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页数:13
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