Effect of annealing temperature on surface morphology and mechanical properties of sputter-deposited Ti-Ni thin films

被引：31

作者：

Zhang, Lei ^{[1
]}

Xie, Chaoying ^{[1
]}

Wu, Jiansheng ^{[1
]}

机构：

[1] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Key Lab Educ, Minst High Temp Mat & Tests, Shanghai 200030, Peoples R China

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2007年 / 427卷 / 1-2期

关键词：

crystallization kinetics; TiNi thin films; surface roughness; mechanical properties;

D O I：

10.1016/j.jallcom.2006.02.067

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

51.39at.%Ti-48.61 at.%Ni thin films were prepared by magnetron sputtering and post-annealed at 450, 500, 550 and 600 degrees C, respectively. Crystallization kinetics of as-deposited Ti-Ni thin films was analyzed using differential scanning calorimetry (DSC). The evolution of structure, surface roughness and mechanical properties of Ti-Ni thin film annealed at different temperature were investigated by X-ray diffactometer (XRD), atomic force microscope (AFM) and nanoindention test. The results show that amorphous Ti-Ni thin films were crystallized at 506.3 degrees C with 18.6 J/g reaction enthalpy. As annealing temperature increased from 450 to 500 degrees C, crystallization degree of Ti-Ni thin film rose and surface roughness increased as well. As for Ti-Ni thin-film annealed above 500 degrees C, TiNi phase precipitated and surface roughness first increased and then decreased with increasing annealing temperature. Moreover, amorphous Ti-Ni thin films are softer than crystalline ones. Microhardness and Young's modulus of crystalline Ti-Ni thin films increased with increasing annealing temperature. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：238 / 243

页数：6

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