High-energy 120 MeV Au9+ ion beam-induced modifications and evaluation of craters in surface morphology of SnO2 and TiO2 nanocomposite thin films

被引:14
|
作者
Kumar, Vikas [1 ]
Gupta, Rashi [1 ]
Chauhan, Vishnu [1 ]
Ram, Jagjeevan [1 ]
Singh, Paramjit [2 ]
Prasad, Mahanth [3 ]
Mehra, Rohit [4 ]
Kumar, Rajesh [1 ]
机构
[1] Guru Gobind Singh Indraprastha Univ, Univ Sch Basic & Appl Sci, New Delhi 110078, India
[2] Gujranwala Guru Nanak Khalsa Coll, Dept Phys, Ludhiana 141001, Punjab, India
[3] CSIR, Cent Elect Engn Res Inst, Transducers & Actuators Grp, Pilani 333031, Rajasthan, India
[4] Dr BR Ambedkar Natl Inst Technol, Dept Phys, Jalandhar 144011, Punjab, India
关键词
Thin films; SHI irradiation; AFM; SEM; XRD; UV-visible; RBS; IRRADIATION-INDUCED MODIFICATIONS; EXCITATION-INDUCED MODIFICATION; INDUCED GRAIN-GROWTH; ELECTRONIC EXCITATION; OPTICAL-PROPERTIES; PHOTOCATALYTIC ACTIVITY; VISIBLE-LIGHT; TEMPERATURE; EVOLUTION; SHI;
D O I
10.1007/s13204-019-01084-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The electronic excitation and modification in the properties of the target material occur due to the kinetic energy loss of incident ions mainly through the inelastic collision with atomic electrons in the process of electronic energy stopping. Nanocomposite tin oxide (SnO2) and titanium dioxide (TiO2) thin film were grown on silicon and ITO substrates using RF magnetron-sputtering process. These thin films were irradiated by 120 MeV Au9+ Swift Heavy Ion (SHI) beam with varying fluence from 5 x 10(11) ions cm(-2) to 2 x 10(13) ions cm(-2) to induce modifications in thin films by dense electronic excitation. Surface morphology and depth profile of craters (approx. 85 nm) have been characterized by multimode atomic force microscopy (AFM). Grain mapping of AFM images provided the variation in grain size in the range of 72-279 nm and RMS roughness increased (4.01-23.6 nm) with increasing the ion fluence. Scanning Electron Microscopy (SEM) was also carried out to confirm the formation of craters in the irradiated film. X-ray diffraction (XRD) technique has been used for the structural analysis of virgin and irradiated thin films. XRD patterns established the formation of film in mixed (rutile and gamma) phase. Further, the crystallite size was evaluated using the Debye-Scherrer and Williamson-Hall method. It was found that crystallite size lie in the range of 36-54 nm which increased for the lower fluence and then decreased for higher fluence. The ion irradiation-induced strain has been explained by Thermal spike and Coulomb explosion model. UV-Vis study showed that the optical band gap reduced from 3.87 to 3.72 eV with increasing the ion fluence which can be ascribed to the formation of intermediate states and free radicals between the valance and band conduction band. Rutherford Backscattering Spectrometry (RBS) ensured that the film thickness decreased from 210 to 183 nm with increasing the ion fluence. The simulation of the RBS spectra provides the elemental composition of Sn (0.37), Ti (0.65) and O (0.85) in SnO2 and TiO2 nanocomposite thin films.
引用
收藏
页码:1265 / 1280
页数:16
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