Concise formula for the Zernike coefficients of scaled pupils

被引：26

作者：

Janssen, Augustus J. E. M. ^{[1
]}

Dirksen, Peter ^{[1
]}

机构：

[1] Philips Res Europe, NL-5656 AE Eindhoven, Netherlands

来源：

JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 2006年 / 5卷 / 03期

关键词：

optical lithography; NA scaling; Zernike coefficients; Strehl ratio;

D O I：

10.1117/1.2345672

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Modern steppers and scanners have a projection lens whose numerical aperture (NA) can be varied so as to optimize the image performance for certain lithographic features. Thus a variable fraction of the aberrations is actually involved in the imaging process. In this letter, we present a concise formula for the NA scaling of the Zernike coefficients. In addition, we apply our results to the Strehl ratio. (C) 2006 Society of Photo-Optical Instrumentation Engineers.

引用

页数：3

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