On the surface chemistry and the reuse of sulfur-doped TiO2 films as photocatalysts

被引:20
作者
Bento, Rodrigo T. [1 ,2 ]
Correa, Olandir V. [1 ]
Pillis, Marina F. [1 ]
机构
[1] Univ Sao Paulo, IPEN CNEN SP, Nucl & Energy Res Inst, Prof Lineu Prestes Ave 2242, Sao Paulo, Brazil
[2] Univ Sao Judas Tadeu, Taquari St 546, Sao Paulo, Brazil
基金
巴西圣保罗研究基金会;
关键词
Titanium dioxide; Sulfur-doped TiO2; MOCVD; Recyclability; Surface analysis;
D O I
10.1016/j.matchemphys.2021.124231
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The surface chemistry and recyclability of sulfur-doped titanium dioxide (TiO2) films was evaluated. The photocatalysts were grown by metalorganic chemical vapor deposition (MOCVD) at 400 degrees C. The films were sulfurdoped at 50 degrees C by using hydrogen sulfide (H2S) as sulfur source. The photocatalytic behavior of the films was measure by monitoring the methyl orange dye decolorization under visible light for several cycles. The films are formed only for the anatase crystalline phase. The results demonstrated that no structural modifications or significant differences in the morphology of the films occurred after their use. The sulfur-doped TiO2 films presented good photocatalytic activity, with an efficiency of 72.1% under visible light in its first use. The durability experiments suggest that even with the dye impregnation on the catalyst surface, the photocatalytic activity of the S-doped TiO2 films remained around 70% in the first 3 cycles, which allows their practical application for water treatment and purification under sunlight.
引用
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页数:7
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