Two-dimensional silica: Structural, mechanical properties, and strain-induced band gap tuning

被引:51
作者
Gao, Enlai [1 ,2 ]
Xie, Bo [1 ,2 ]
Xu, Zhiping [1 ,2 ,3 ]
机构
[1] Tsinghua Univ, Dept Engn Mech, Appl Mech Lab, Beijing 100084, Peoples R China
[2] Tsinghua Univ, Ctr Nano & Micro Mech, Beijing 100084, Peoples R China
[3] Nanjing Univ Aeronaut & Astronaut, State Key Lab Mech & Control Mech Struct, Nanjing 210016, Jiangsu, Peoples R China
基金
中国国家自然科学基金;
关键词
GLASS;
D O I
10.1063/1.4939279
中图分类号
O59 [应用物理学];
学科分类号
摘要
Two-dimensional silica is of rising interests not only for its practical applications as insulating layers in nanoelectronics, but also as a model material to understand crystals and glasses. In this study, we examine structural and electronic properties of hexagonal and haeckelite phases of silica bilayers by performing first-principles calculations. We find that the corner-sharing SiO4 tetrahedrons in these two phases are locally similar. The robustness and resilience of these tetrahedrons under mechanical perturbation allow effective strain engineering of the electronic structures with band gaps covering a very wide range, from of that for insulators, to wide-, and even narrowgap semiconductors. These findings suggest that the flexible 2D silica holds great promises in developing nanoelectronic devices with strain-tunable performance, and lay the ground for the understanding of crystalline and vitreous phases in 2D, where bilayer silica provides an ideal test-bed. (c) 2016 AIP Publishing LLC.
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页数:7
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