Synthesis and TEM study of nanoparticles and nanocrystalline thin films of silver by high pressure sputtering

被引:39
作者
Chandra, R
Taneja, P
John, J
Ayyub, P
Dey, GK
Kulshreshtha, SK
机构
[1] Tata Inst Fundamental Res, Dept Condensed Matter Phys & Mat Sci, Bombay 400005, Maharashtra, India
[2] Bhabha Atom Res Ctr, Div Mat Sci, Bombay 400085, Maharashtra, India
[3] Bhabha Atom Res Ctr, Novel Mat & Struct Chem Div, Bombay 400085, Maharashtra, India
来源
NANOSTRUCTURED MATERIALS | 1999年 / 11卷 / 08期
关键词
D O I
10.1016/S0965-9773(99)00408-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High pressure magnetron sputtering is a very promising technique for the controlled synthesis of nanocrystalline thin films as well as nanoparticles of various systems. Here we discuss the conditions necessary for the synthesis of nanocrystalline silver both in the thin film and powder forms. The formation of the nanophase material occurs in a relatively high pressure of inert gas and at low substrate temperatures (77-300 K). The mean crystallographic domain size of the nanocrystalline silver thus synthesized was found to lie in the 3-60 nm range. The growth pattern and morphology of the sputter-deposited nano-grains were studied in detail using transmission electron microscopy and atomic force microscopy. (C) 2000 Acta Metallurgica Inc.
引用
收藏
页码:1171 / 1179
页数:9
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