Effect of nano-patterning of p-GaN cladding layer on photon extraction efficiency

被引:14
作者
Hong, Eun-Ju [1 ]
Byeon, Kyeong-Jae [1 ]
Park, Hyoungwon [1 ]
Hwang, Jaeyeon [1 ]
Lee, Heon [1 ]
Choi, Kyungwoo [2 ]
Kim, Hyeong-Seok [3 ]
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul 136701, South Korea
[2] Korea Inst Nucl Safety, Taejon 305338, South Korea
[3] Chung Ang Univ, Dept Elect & Elect Engn, Seoul 156756, South Korea
关键词
Nano-pattern; GaN; Photon extraction efficiency; Green LED; Photoluminescence; Nanoimprint lithography; LIGHT-EMITTING-DIODES; DRY-ETCH DAMAGE; NANOIMPRINT LITHOGRAPHY; RECOVERY; PERFORMANCE; IMPROVEMENT; INTENSITY;
D O I
10.1016/j.sse.2009.05.007
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Various sized nano-patterns, ranging from 0.8 mu m x 0.4 mu m to 2.0 mu m x 1.0 mu m were formed on the p-GaN top cladding layer of green LED, in order to increase photon extraction efficiency by suppressing total internal reflection. Fabrication of nano-patterns was done by UV nanoimprint lithography and reactive ion etching of p-GaN using SiCl4 and At gases using SiO2 as an etch mask. The effect of various nano-patterns on top p-GaN layer was investigated by photoluminescence. Compared to LED structure without nano-patterns on top cladding layer, the LED structures with sub-micron sized nano-patterns exhibit up to four times stronger emission intensity. This implies that the photon extraction efficiency of LED structures was increased by nano-patterns on top p-GaN layer. However, the luminescence intensity of LED structures with patterns greater than a micron, was less increased. (C) 2009 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1099 / 1102
页数:4
相关论文
共 19 条
[1]   Fabrication of two-dimensional photonic crystal patterns on GaN-based light-emitting diodes using thermally curable monomer-based nanoimprint lithography [J].
Byeon, Kyeong-Jae ;
Hwang, Seon-Yong ;
Lee, Heon .
APPLIED PHYSICS LETTERS, 2007, 91 (09)
[2]   Enhanced light output from aligned micropit InGaN-based light emitting diodes using wet-etch sapphire patterning [J].
Cuong, T. V. ;
Cheong, H. S. ;
Kim, H. G. ;
Kim, H. Y. ;
Hong, C. -H. ;
Suh, E. K. ;
Cho, H. K. ;
Kong, B. H. .
APPLIED PHYSICS LETTERS, 2007, 90 (13)
[3]   Increase in the extraction efficiency of GaN-based light-emitting diodes via surface roughening [J].
Fujii, T ;
Gao, Y ;
Sharma, R ;
Hu, EL ;
DenBaars, SP ;
Nakamura, S .
APPLIED PHYSICS LETTERS, 2004, 84 (06) :855-857
[4]   High-density plasma-induced etch damage of InGaN/GaN multiple quantum well light-emitting diodes [J].
Hahn, YB ;
Choi, RJ ;
Hong, JH ;
Park, HJ ;
Choi, CS ;
Lee, HJ .
JOURNAL OF APPLIED PHYSICS, 2002, 92 (03) :1189-1194
[5]   Recovery of dry etch-induced damage of nano-patterned GaN-based light-emitting diodes by rapid-thermal-annealing [J].
Hong, Hyun-Gi ;
Kim, S. -S. ;
Kim, D. -Y. ;
Lee, Takhee ;
Kim, Kyoung-Kook ;
Song, June-O ;
Cho, J. H. ;
Seong, Tae-Yeon .
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2007, 204 (03) :881-886
[6]   Improvement of InGaN-GaN light-emitting diode performance with a nano-roughened p-GaN surface [J].
Huang, HW ;
Kao, CC ;
Chu, JI ;
Kuo, HC ;
Wang, SC ;
Yu, CC .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2005, 17 (05) :983-985
[7]   Improved light-output and electrical performance of InGaN-based, light-emitting diode by microroughening of the p-GaN surface [J].
Huh, C ;
Lee, KS ;
Kang, EJ ;
Park, SJ .
JOURNAL OF APPLIED PHYSICS, 2003, 93 (11) :9383-9385
[8]   Efficiency enhancement in a light-emitting diode with a two-dimensional surface grating photonic crystal [J].
Ichikawa, H ;
Baba, T .
APPLIED PHYSICS LETTERS, 2004, 84 (04) :457-459
[9]   Mechanical stability of a flexible ferroelectric liquid crystal display with a periodic array of columnar spacers [J].
Kim, DW ;
Yu, CJ ;
Lim, YW ;
Na, JH ;
Lee, SD .
APPLIED PHYSICS LETTERS, 2005, 87 (05)
[10]   Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin [J].
Lee, H ;
Jung, GY .
MICROELECTRONIC ENGINEERING, 2005, 77 (02) :168-174